NT
Neha Thakur
Indian Institute of Technology Mandi, PiBond, University of Amsterdam, University of Delhi, Microsoft HoloLens
0000-0001-5252-0938
Employment
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Indian Institute of Technology Mandi Assistant Professor2025 - Present
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Indian Institute of Technology Mandi Institute Postdoctoral Fellow2024 - 2025
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PiBond Senior Material Scientist2024 - 2024
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Microsoft HoloLens Material Technology Specialist2022 - 2024
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Advanced Research Center for Nanolithography (Netherlands) Ph.D. student2018 - 2022
Education
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University of Amsterdam Ph.D. student2018 - 2022
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University of Delhi M.Sc.2014 - 2016
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University of Delhi B.Sc.2011 - 2014
Projects & Funding
Projects & funding information is unavailable.
Publications (16)
- Dual-component functionalized allylated calix[4]arene-dibutyltin diacrylate blends as organic-inorganic hybrid resist compositions for nanolithography Save
- N-heterocycles for inducing high-sensitivity to inorganic resist compositions Save
- Synergetic catalysis methods for sustainable wastewater treatment Save
- Advances in oxide semiconductors for flexible and stretchable thin film transistors Save
- Direct Patterning of CsPbBr3 Nanocrystals via Electron-Beam Lithography Save
- Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance Save
- Bottom-Up Nanofabrication with Extreme-Ultraviolet Light: Metal-Organic Frameworks on Patterned Monolayers Save
- Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography Save
- Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography Save
- Mixed-ligand zinc-oxoclusters: Efficient chemistry for high resolution nanolithography Save