Raghvendra Tewari

Employment

• Bhabha Atomic Research Centre

Education

Education history is unavailable.

Projects & Funding

Projects & funding information is unavailable.

Publications (167)

• Correlative SANS and TEM investigation on precipitation kinetics of H-phase in Ni<inf>50.3</inf>Ti<inf>29.7</inf>Hf<inf>20</inf> high temperature shape memory alloy
  Journal of Alloys and Compounds 2019 DOI: 10.1016/j.jallcom.2018.11.303
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• High temperature behaviour of NbSi<inf>2</inf> coating on the Nb-1Zr-0.1C alloy
  Surface Engineering 2019 DOI: 10.1080/02670844.2019.1622204
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• High temperature oxidation behaviour of V-Ti-Ta alloys
  Fusion Engineering and Design 2019 DOI: 10.1016/j.fusengdes.2019.04.070
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• Morphological evolution of transformation products and eutectoid transformation(s) in a hyper-eutectoid Ti-12 at% Cu alloy
  Acta Materialia 2019 DOI: 10.1016/j.actamat.2019.01.044
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• ParA proteins of secondary genome elements cross-talk and regulate radioresistance through genome copy number reduction in Deinococcus radiodurans
  Biochemical Journal 2019 DOI: 10.1042/BCJ20180799
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• Role of irradiation induced defects in altering the micro-mechanical response of Zr domains during nano indentation: A molecular dynamics study
  Computational Materials Science 2019 DOI: 10.1016/j.commatsci.2019.01.036
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• Short-term corrosion behavior of Indian RAFM steel in liquid Pb-Li: Corrosion mechanism and effect of alloying elements
  Journal of Nuclear Materials 2019 DOI: 10.1016/j.jnucmat.2019.04.018
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• Wear Behavior of Vanadium and V-Ti-Ta Alloys under Reciprocating Sliding Conditions
  Journal of Materials Engineering and Performance 2019 DOI: 10.1007/s11665-019-04090-3
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• Catalytic properties of dispersed iron oxides Fe<inf>2</inf>O<inf>3</inf>/MO<inf>2</inf> (M = Zr, Ce, Ti and Si) for sulfuric acid decomposition reaction: Role of support
  International Journal of Hydrogen Energy 2018 DOI: 10.1016/j.ijhydene.2017.10.163
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• Electrochemical investigation of uranyl species reduction in alkaline oxalate electrolyte and microstructural characterization of deposited nanocrystalline UO<inf>2</inf> thin films
  Journal of Electroanalytical Chemistry 2018 DOI: 10.1016/j.jelechem.2018.01.060
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