0000-0001-6844-1222 Employment
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Publications (25)
- Design and improved performance of gate stacked dual material gate all around nanowire field effect transistor with spacer based underlap extension Save
- A scalable asymmetric triple-metal gate-all-around nanowire MOSFET architecture with hybrid SiGe/Ge/InGaAs channel Save
- Performance analysis of GAA nanowire MOSFET through dielectric pocket and tri metal gate engineering Save
- Design and optimization of high electron mobility transistor with high-k dielectric material integration Save
- Design and Performance Analysis of Gate Overlap Dual Material Tunnel Field Effect Transistor Save
- Design and performance analysis of front and back Pi 6 nm gate with high K dielectric passivated high electron mobility transistor Save
- Design and analysis of asymmetrical low-k source side spacer halo doped nanowire metal oxide semiconductor field effect transistor Save
- Design, Performance Analysis of GaAs/6H-SiC/AlGaN Metal Semiconductor FET in Submicron Technology Save
- Comparison of Drain Current Characteristics of Advanced MOSFET Structures - a Review Save
- Device Design, Simulation and Qualitative Analysis of GaAsP/ 6H-SiC/ GaN Metal Semiconductor Field Effect Transistor Save