Triratna Muneshwar

Employment

• Indian Institute of Technology Bombay Assistant Professor
  2021 - Present
• University of Alberta Post-Doctoral fellow
  2015 - 2021

Education

• University of Alberta Ph.D
  2009 - 2014
• Indian Institute of Technology Bombay B.Tech + M.Tech
  2004 - 2009

Projects & Funding

Projects & funding information is unavailable.

Publications (18)

• A plasmon-electron addressable and CMOS compatible random access memory
  Science Advances 2025 DOI: 10.1126/sciadv.adr1172
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• TiO2-HfN Radial Nano-Heterojunction: A Hot Carrier Photoanode for Sunlight-Driven Water-Splitting
  Catalysts 2021 DOI: 10.3390/catal11111374
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• Stoichiometry controlled homogeneous ternary oxide growth in showerhead atomic layer deposition reactor and application for ZrxHf1−xO2
  Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 2021 DOI: 10.1116/6.0000856
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• Resolving self-limiting growth in silicon nitride plasma enhanced atomic layer deposition with tris-dimethylamino silane precursor
  Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 2020 DOI: 10.1116/6.0000493
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• Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
  Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 2019 DOI: 10.1116/1.5091944
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• ZnO Schottky Nanodiodes Processed From Plasma-Enhanced Atomic Layer Deposition at Near Room Temperature
  IEEE Transactions on Electron Devices 2018 DOI: 10.1109/TED.2018.2866598
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• Surface reaction kinetics in atomic layer deposition: An analytical model and experiments
  Journal of Applied Physics 2018 DOI: 10.1063/1.5044456
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• Chapter 11 - Atomic Layer Deposition: Fundamentals, Practice, and Challenges
  Handbook of Thin Film Deposition (Fourth Edition) 2018 DOI: https://doi.org/10.1016/B978-0-12-812311-9.00011-6
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• Comparing XPS on bare and capped ZrN films grown by plasma enhanced ALD: Effect of ambient oxidation
  Applied Surface Science 2018 DOI: 10.1016/j.apsusc.2017.11.104
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• Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
  J. Vac. Sci. Technol. A 2016 DOI: 10.1116/1.4961885
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