Tathagata Ray

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Publications (3)

• Characterization of KMPR® 1025 as a masking layer for deep reactive ion etching of fused silica
  Micro Electro Mechanical Systems (MEMS), 2011 IEEE 24th International Conference on 2011 DOI: 10.1109/MEMSYS.2011.5734399
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• Deep reactive ion etching of fused silica using a single-coated soft mask layer for bio-analytical applications
  Journal of Micromechanics and Microengineering 2010 DOI: 10.1088/0960-1317/20/9/097002
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• Characterization of deep wet etching of fused silica glass for single cell and optical sensor deposition
  Journal of Micromechanics and Microengineering 2009 DOI: 10.1088/0960-1317/19/6/065013
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