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Publications (14)
- Simulation of Interference‐Enhanced Raman Amplification for Advanced Microelectronic Applications Save
- A benchmark of profiling techniques for the examination of silicon with low dopant concentrations across wide fields of view Save
- (Invited) Epitaxial Process Development and Challenges for Advanced SiGe BiCMOS Save
- Benchmarking of HCl-Based Cyclic Deposition / Etch (CDE) and Single Deposition / Etch (DE) Processes for Selective Epitaxial Growth of SiGeC:B Films Save
- Boron Delta-Doping in Si : B Stacks By RP-CVD Epitaxy Save
- Nucleation and Growth Mechanisms of Polycrystalline Sige-Based Materials By Chemical Vapor Deposition at Reduced Pressure Save
- (Invited) Epitaxial Process Development and Challenges for Advanced SiGe BiCMOS Save
- Benchmarking of HCl-Based Cyclic Deposition / Etch (CDE) and Single Deposition / Etch (DE) Processes for Selective Epitaxial Growth of SiGeC:B Films Save
- Boron Delta-Doping in Si : B Stacks By RP-CVD Epitaxy Save
- Relaxation Dynamics of Heteroepitaxial Films on Mesa-Strip Designs Save