0000-0002-5597-9450 Employment
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Publications (37)
- Phase coexistence in Y - and La -doped Hf0.5Zr0.5O2 thin films and its effect on the electrical properties in functional capacitors Save
- Age and Charge Effects in Cortical Bone: Raman Study of Phosphate Ions Stretching Save
- Structural and Chemical Evolution of Ni0.8Mo0.2/Ti Multilayers: Impact of Ultrathin Si and C Barrier Layers Save
- Formation of intermetallic phases and texture evolution in Ni0.95Mo0.05/Ti multilayer Save
- Influence of Silicon Interlayers on Transition Layer Formation in Ti/Ni Multilayer Structures of Different Thicknesses Save
- Influence of silicon interlayers on transition layer formation in Ti/Ni multilayer structures of different thicknesses Save
- Structural Evolution of Nanoscale Ferroelectric Hf0.5Zr0.5O2 Layers as a Result of Their Cyclic Electrical Stimulation Save
- Formation of a Polar Ferroelectric Phase in HFO2 Films Depending on Annealing Conditions and Chemical Properties of Impurities Save
- Controlling ferroelectric properties in Y-doped HfO2 thin films by precise introduction of oxygen vacancies Save
- Role of Postdeposition Annealing and Doping with Si and Al Impurities in the Formation of Hf x Si1-x O2 at the SiO2/FE:HfO2 Interface in a Ferroelectric Field-Effect Transistor Save