Adam Teman

Employment

• Bar-Ilan University Academic , Full Professor, Full Professor
  2024 - Present
• Bar-Ilan University Associate Professor
  2015 - Present
• Bar-Ilan University Researcher
  2015 - Present
• Bar-Ilan University
  2015 - Present
• École Polytechnique Fédérale de Lausanne Post-doctoral Fellow
  2014 - 2015
• Marvell Israel Ltd Design Engineer (Backend)
  2006 - 2007
• Bar Ilan University

Education

• Ben-Gurion University of the Negev PhD
  2011 - 2014
• Ben-Gurion University of the Negev MSc
  2008 - 2011
• Ben-Gurion University of the Negev BSc
  2002 - 2006

Projects & Funding

Projects & funding information is unavailable.

Publications (184)

• Cyclic Refresh Algorithm for Ensuring 100% Memory Availability in Gain-Cell Embedded DRAM Macros
  IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems 2026 DOI: 10.1109/TCAD.2026.3652963
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• GC-BNN
  Journal of Systems Architecture 2026 DOI: 10.1016/j.sysarc.2026.103867
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• Trans-precision NPU for resource-efficient mobile AI acceleration
  Journal of Systems Architecture 2026 DOI: 10.1016/j.sysarc.2026.103866
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• SPARCAM: Sparse matrix multiplication accelerator using multi-port dynamic CAM
  Journal of Systems Architecture 2026 DOI: 10.1016/j.sysarc.2026.103726
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• GenMClass
  Journal of Systems Architecture 2026 DOI: 10.1016/j.sysarc.2026.103702
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• GainP
  Journal of Systems Architecture 2026 DOI: 10.1016/j.sysarc.2025.103632
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• Integrated BSI bacteria identifier-on-chip using approximate k-mer matching
  Scientific Reports 2026 DOI: 10.1038/s41598-026-36497-z
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• A Cryogenic 2T GC-eDRAM With an Inverter-Based Readout Scheme and an 80 ms Retention Time
  IEEE Transactions on Very Large Scale Integration (VLSI) Systems 2026 DOI: 10.1109/TVLSI.2026.3661652
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• AM5: Bulk Logic-in-Memory Using MRAM NAND Crossbar
  IEEE Journal on Emerging and Selected Topics in Circuits and Systems 2026 DOI: 10.1109/JETCAS.2026.3689530
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• BRAIN-AD: A Bit-Serial, ReRAm-Empowered Digital Processing-In-Memory Macro for Autonomous Driving
  IEEE Transactions on Nanotechnology 2026 DOI: 10.1109/TNANO.2026.3720322
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