Anupama Anand
University of Delhi, Babasaheb Bhimrao Ambedkar Bihar University, Chandrasheel Vidyapeeth
About
Presently engaged as a Senior Research Scholar at the Solid State Physics Laboratory (SSPL), Defence Research and Development Organisation (DRDO), Ministry of Defence, Government of India. Concurrently, she is pursuing her Ph.D. in Electronic Science at the University of Delhi, South Campus.
She holds a Bachelor of Science (B.Sc.) degree in Electronic Science from Babasaheb Bhimrao Ambedkar Bihar University (BRABU), earned in 2016, and a Master of Science (M.Sc.) in Electronic Science from the University of Delhi, completed in 2018.
Her doctoral research focuses on the simulation and radio-frequency (RF) modeling of Gallium Nitride (GaN) High Electron Mobility Transistors (HEMTs)—semiconductor devices known for their superior performance in high-power and high-frequency applications. Her work involves the use of Technology Computer-Aided Design (TCAD) tools for predictive device modeling and compact model extraction for RF circuit integration, contributing to advancements in defense-grade electronic systems and strategic semiconductor technologies.
Employment
Employment history is unavailable.
Education
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University of Delhi Post-Graduation (M.Sc.)2016 - 2018
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Babasaheb Bhimrao Ambedkar Bihar University Graduation (B. Sc. Honors)2012 - 2016
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Chandrasheel Vidyapeeth Intermediate2010 - 2012
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Prabhat Tara Girls’ High School Matriculation? - 2010
Projects & Funding
Projects & funding information is unavailable.
Publications (16)
- Impact of Oblique Heavy Ion Irradiation on the Transient Response of Ga 2 O 3 MODFETs Save
- Reliability of GaN - based MISHEMTs incorporating a Buffer - Free Architecture post High Intensity UV Radiation Save
- Impact of Gate Length Scaling on Small-Signal Parameters for AlGaN-Channel HEMT with Graded AlGaN Buffer Save
- Small Signal and Large Signal Analysis of 150 nm GaN HEMT with Optimized Field Plates for Ku-Band Application Save
- Investigating RF Parameters with Diverse Field Plate Structure for AlGaN/GaN HEMT with 0.15 µm Gate Length Save
- Impact of Graded AlGaN Buffer Layer Thickness on the DC, RF, Linearity, Intermodulation and Off-State Breakdown Characteristics of AlGaN Channel HEMT Save
- Optimization of 150 nm GaN HEMT for Ku-band applications using field plate engineering Save
- Efficacy of back barrier engineered Π-gate InAlN/GaN high electron mobility transistors for high-power applications Save
- Impact of barrier layer thickness on DC and RF performance of AlGaN/GaN high electron mobility transistors Save
- A Compact Large-Signal Model Generation of GaN HEMT for RF Circuit Design Implication Save