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Publications (6)
- A Generic Framework for MOSFET Reliability—Part II: Gate and Drain Stress—HCD Save
- Modeling of Classical Channel Hot Electron Degradation in n-MOSFETs Using TCAD Save
- Modeling Time and Bias Dependence of Classical HCD Mechanism (Peak ISUBStress) in n-MOSFETs Save
- Modeling of Channel Hot Electron Degradation in n-MOSFETs Save
- TCAD Framework for HCD Kinetics in Low VDDevices Spanning Full VG/VDSpace Save
- Study of Gate Misalignment Effects in Single-Material Double-Gate (SMDG) MOSFET Considering Source and Drain Lateral Gaussian Doping Profile Save