Jagannath Panigrahi

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Publications (14)

• Importance of precursor delivery mechanism for Tetra-kis-ethylmethylaminohafnium/water atomic layer deposition process
  Thin Solid Films 2019 DOI: 10.1016/j.tsf.2019.137629
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• Enhanced field effect passivation of c-Si surface via introduction of trap centers: Case of hafnium and aluminium oxide bilayer films deposited by thermal ALD
  Solar Energy Materials and Solar Cells 2018 DOI: 10.1016/j.solmat.2018.08.018
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• Atomic layer deposited dielectric and/or semiconducting oxide bilayers for crystalline silicon surface passivation
  Energy Procedia 2017 DOI: 10.1016/j.egypro.2017.09.303
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• Crystalline silicon surface passivation by thermal ALD deposited Al doped ZnO thin films
  AIP Advances 2017 DOI: 10.1063/1.4979326
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• Study of Al <inf>2</inf> O <inf>3</inf> /ZnO multilayers for silicon surface passivation
  2017 IEEE 44th Photovoltaic Specialist Conference, PVSC 2017 2017 DOI: 10.1109/PVSC.2017.8366701
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• Impedance spectroscopy of crystalline silicon solar cell: Observation of negative capacitance
  Solar Energy 2016 DOI: 10.1016/j.solener.2016.06.041
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• Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
  RSC Advances 2016 DOI: 10.1039/c6ra19442g
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• Study of Al<inf>2</inf>O<inf>3</inf>/ZnO multilayers for silicon surface passivation
  Conference Record of the IEEE Photovoltaic Specialists Conference 2016 DOI: 10.1109/PVSC.2016.7750204
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• Influence of deposition temperature of thermal ALD deposited Al<inf>2</inf>O<inf>3</inf> films on silicon surface passivation
  AIP Advances 2015 DOI: 10.1063/1.4922267
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• Silicon surface passivation using thin HfO <inf>2</inf> films by atomic layer deposition
  Applied Surface Science 2015 DOI: 10.1016/j.apsusc.2015.09.020
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