AD
Prof. Dr. Anjana Devi
Leibniz Institute for Solid State and Materials Research, Fraunhofer Institute for Microelectronic Circuits and Systems, Ruhr-Universität Bochum, Indian Institute of Science (IISc)
0000-0003-2142-8105
Employment
-
Leibniz Institute for Solid State and Materials Research Director and Professor2024 - Present
-
Fraunhofer Institute for Microelectronic Circuits and Systems Head2022 - Present
-
Ruhr University Bochum Prof.2002 - 2023
Education
-
Ruhr-Universität Bochum Post-doctoral researcher: Alexander von Humboldt Foundation, (AvH)Germany1998 - 2002
-
Indian Institute of Science (IISc) PhD1991 - 1997
Projects & Funding
Projects & funding information is unavailable.
Publications (257)
- A Liquid Ruthenium Precursor for Atomic Layer Deposition of Low-Resistivity Ruthenium Films Save
- Publishing FAIR and machine-actionable reviews in materials science: The case for symbolic knowledge in neuro-symbolic artificial intelligence Save
- Structuring large area WS2 layers grown by atomic layer deposition Save
- Amido‐Amine Co(II) Precursor‐Based Atomic/Molecular Layer Deposition Processes for Cobalt‐Organic Thin Films and Their Thermal Conversion to CoO Thin Films Save
- Defect Engineering in Atomic-Layer-Deposited Cerium Oxide Save
- Formation and Characterization of Transparent Conductive Oxide SnO2:Ta Grown at Low Deposition Temperature Save
- A New Synthetic Method for HfS2 Thin Films Using MOCVD Save
- Cover Feature: Metamorphosis of Multilayered‐(NH4)2V7O16 Squares to Zinc Vanadate and w‐ZnO Nanoparticles via Zinc Metalation through Atomic Layer Deposition: Precision and Sustainability in Material Transformation (Chem. Methods 1/2026) Save
- Metamorphosis of Multilayered‐(NH4)2V7O16 Squares to Zinc Vanadate and w‐ZnO Nanoparticles via Zinc Metalation through Atomic Layer Deposition: Precision and Sustainability in Material Transformation Save
- Atomic layer deposition of NiOx: harnessing the potential of new precursor combinations for photoelectrochemical water oxidation Save