Alok Ranjan

About

Dr. Alok Ranjan focuses on developing next-generation techniques for advanced materials characterization, with a particular emphasis on pushing the boundaries of transmission electron microscopy (TEM) and in situ methods to gain critical insights into material behavior. By enabling a deeper understanding of structure - property relationships at the nanoscale, these approaches aim to contribute to solving key societal challenges in areas such as sustainable energy, electronics, and next-generation technologies. My research centers on application-oriented electron microscopy, with a core focus on correlating structure and property relationships. This involves following two objectives:

1. Development of in situ solutions and MEMS chip development
The goal is to advance infrastructure for in situ electron microscopy experiments by adapting existing solutions and developing novel approaches, particularly for solid and liquid environments. Recognizing that in situ experiment requirements vary significantly across material systems, I am developing versatile, operando methodologies. such as those enabled by customized MEMS chip development. I am exploring a broader range of systems driven by varied applications including 2D materials, semiconductors, materials for quantum technology, and soft materials for emerging applications. Examples of in situ applications include high electric and magnetic field and temperature both under vacuum and liquid environments.

2. Multi-modal analysis
I am establishing workflows that enable seamless integration between TEM and complementary characterization techniques. While TEM offers atomic-scale resolution, its stringent sample requirements often limit applicability. To address this, together with collaborators, I am developing strategies for transferring and correlating samples across platforms such as optical microscopy and synchrotron-based methods, enabling comprehensive, multi-scale analysis.

Employment

• Chalmers University of Technology Postdoctoral Researcher
  2021 - Present
• Singapore University of Technology and Design Postdoctoral Researcher
  2019 - 2021

Education

Education history is unavailable.

Projects & Funding

Projects & funding information is unavailable.

Publications (35)

• Probing Traps in Ta2O5/Al2O3 Memristive Switching Devices
  ACS Applied Electronic Materials 2026 DOI: 10.1021/acsaelm.5c01880
  +Save
• Correlating Synthesis, Structure, and Thermal Stability of CuBi Nanowires for Spintronic Applications by Electron Microscopy and in Situ Scattering Methods
  ACS Nano 2025 DOI: 10.1021/acsnano.5c09560
  +Save
• Investigation of Electrical Breakdown in AlGaN/GaN/AlN HEMTs Through Nanoscale Analysis and Physics-Based Modeling
  IEEE Transactions on Device and Materials Reliability 2025 DOI: 10.1109/TDMR.2025.3621211
  +Save
• Ultrathin 3R-MoS2 metasurfaces with atomically precise edges for efficient nonlinear nanophotonics
  Communications Physics 2025 DOI: 10.1038/s42005-025-02194-y
  +Save
• Microscopic Analysis of Degradation and Breakdown Kinetics in HfO2 Gate Dielectric after Ions Irradiation
  ACS Applied Materials & Interfaces 2025 DOI: 10.1021/acsami.5c09755
  +Save
• Dielectric Breakdown Mechanisms in High-κ Antimony Trioxide (Sb2O3)
  ACS Applied Electronic Materials 2024 DOI: 10.1021/acsaelm.4c01818
  +Save
• Electrodes for High‐𝜅 Molecular Crystal Antimony Trioxide Gate Dielectrics for 2D Electronics
  Advanced Electronic Materials 2024 DOI: 10.1002/aelm.202400205
  +Save
• Estimating the Number of Defects in a Single Breakdown Spot of a Gate Dielectric
  IEEE Electron Device Letters 2024 DOI: 10.1109/LED.2024.3375952
  +Save
• Guidelines for the Design of Random Telegraph Noise-Based True Random Number Generators
  IEEE Transactions on Device and Materials Reliability 2024 DOI: 10.1109/TDMR.2024.3394576
  +Save
• Adhesion Microscopy as a Nanoscale Probe for Oxidation and Charge Generation at Metal-Oxide Interfaces
  ACS Applied Electronic Materials 2023 DOI: 10.1021/acsaelm.3c00903
  +Save