Harmeet Singh

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Publications (11)

• Plasma Etch in the Era of Atomic Scale Fidelity
  ECS Meeting Abstracts 2014 DOI: 10.1149/ma2014-02/32/1673
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• Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks
  Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 2002 DOI: 10.1116/1.1502698
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• Maintaining reproducible plasma reactor wall conditions: SF6 plasma cleaning of films deposited on chamber walls during Cl2/O2 plasma etching of Si
  Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 2002 DOI: 10.1116/1.1479733
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• Deposition of silicon oxychloride films on chamber walls during Cl2/O2 plasma etching of Si
  Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 2002 DOI: 10.1116/1.1450578
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• Measurements of neutral and ion composition, neutral temperature, and electron energy distribution function in a CF4 inductively coupled plasma
  Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 2001 DOI: 10.1116/1.1354603
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• Surface loss coefficients of CFx and F radicals on stainless steel
  Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 2000 DOI: 10.1116/1.1308585
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• Measurements of the electron energy distribution function in molecular gases in a shielded inductively coupled plasma
  Journal of Applied Physics 2000 DOI: 10.1063/1.1290450
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• Recombination coefficients of O and N radicals on stainless steel
  Journal of Applied Physics 2000 DOI: 10.1063/1.1289046
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• Measurements of the electron energy distribution function in molecular gases in an inductively coupled plasma
  Journal of Applied Physics 2000 DOI: 10.1063/1.373036
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• Appearance potential mass spectrometry: Discrimination of dissociative ionization products
  Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 2000 DOI: 10.1116/1.582183
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• Mass spectrometric detection of reactive neutral species: Beam-to-background ratio
  Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 1999 DOI: 10.1116/1.581981
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